Overlay chek, Auto Optical Inspection (AOI) equipment capable of measuring critical dimension (CD) and overlay shift. The best choice for increasing quality and reducing time efficiently during mask alignment and the etching process.
*Method:Optical measurement by vision light
*Optical resolution:0.055um@100x ,0.11um@50x,0.275um@20X ,0.55um@10x
*Wafer size:2” ~12”
*Function
1.Auto loader
2.Auto Focus
3.Pre-alignment
4.Fine-alignment
5.Auto measurement by recipe
*Scan result:Critical Dimension (CD);Overlay shift (OL)
System introduction :Case studyCXsemi youtube channel.There are links on the left, please click for reference.
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